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Polishing of {100} and {111} single crystal diamond through the use of Chemical Mechanical Polishing

机译：通过使用抛光{100}和{111}单晶金刚石化学机械抛光

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Diamond is one of the hardest and most difficult to polish materials. In thispaper, the polishing of {111} and {100} single crystal diamond surfaces bystandard Chemical Mechanical Polishing, as used in the silicon industry, isdemonstrated. A Logitech Tribo Chemical Mechanical Polishing system withLogitech SF1 Syton and a polyurethane/polyester polishing pad was used. Areduction in roughness from 0.92 to 0.23 nm root mean square (RMS) and 0.31 to0.09 nm RMS for {100} and {111} samples respectively was observed.

机译：钻石是最难抛光的材料之一。在本文中，展示了通过硅行业中标准的化学机械抛光对{111}和{100}单晶金刚石表面进行的抛光。使用具有Logitech SF1 Syton和聚氨酯/聚酯抛光垫的Logitech Tribo化学机械抛光系统。对于{100}和{111}样品，观察到粗糙度分别从0.92至0.23nm均方根（RMS）和0.31至0.09nm RMS降低。

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Thomas, Evan L. H.; Mandal, Soumen; Brousseau, Emmanuel B.; Williams, Oliver A.;
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年度 2014
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1. Sub-nanoscale polishing of single crystal diamond(100) and the chemical behavior of nanoparticles during the polishing process [J] . Yuan Song, Guo Xiaoguang, Huang Junxin, Diamond and Related Materials . 2019,第期

机译：单晶金刚石（100）的亚纳米级抛光和纳米粒子的抛光过程中的化学行为
2. Polishing mechanism and surface damage analysis of type IIa single crystal diamond processed by mechanical and chemical polishing methods [J] . Tatsumi Natsuo, Harano Katsuko, Ito Toshimichi, Diamond and Related Materials . 2016,第Null期

机译：机械和化学抛光方法处理的IIa型单晶金刚石的抛光机理和表面损伤分析
3. Silica based polishing of {100} and {111} single crystal diamond [J] . Science and technology of advanced materials . 2014,第3期

机译：{100}和{111}单晶金刚石的二氧化硅基抛光
4. Qxidant for Chemical Mechanical Polishing of Single Crystal Diamond [C] . Zhuoying Shi, Zhuji Jin, Hongming Xue China-Japan International Conference on Ultra-Precision Machining Process . 2014

机译：单晶金刚石的化学机械抛光葡萄干
5. Mandrel-based Polishing of Single-Crystal Diamond and Ceramics for Fabrication of Micro-endmills: Analysis of the Polishing Characteristics and the Error Motions of Ultra-High-Speed Micromachining Spindles. [D] . Anandan, Krishna Prashanth. 2012

机译：用于微立铣刀制造的单晶金刚石和陶瓷的基于心轴的抛光：超高速微加工主轴的抛光特性和误差运动分析。
6. Silica based polishing of {100} and {111} single crystal diamond [O] . Evan L H Thomas, Soumen Mandal, Emmanuel B Brousseau, 2014

机译：{100}和{111}单晶金刚石的二氧化硅基抛光
7. Silica based polishing of {100} and {111} single crystal diamond [O] . Thomas, Evan L. H., Mandal, Soumen, Brousseau, Emmanuel Bruno Jean Paul, 2014

机译：{100}和{111}单晶金刚石的二氧化硅基抛光
8. Structure of Silver (100) and (111) Single-Crystal Surfaces Obtained by Chemical Polishing [R] . Adzic, R. R., Hanson, M. E., Yeager, E. B. 1983

机译：通过化学抛光获得的银（100）和（111）单晶表面的结构

Polishing of {100} and {111} single crystal diamond through the use of Chemical Mechanical Polishing

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